Please use this identifier to cite or link to this item: http://localhost:8080/xmlui/handle/123456789/1580
Title: Effect of annealing temperature on the structural and optical properties of ZnO thin films prepared by RF magnetron sputtering
Authors: Daniel, G P
Justinvictor, V B
Prabitha, B N
Joy, K
Peter Koshy
Thomas, P V
Keywords: RF sputtering
ZnO thin films
AFM
Skewness
Kurtosis
Optical constants
Pulsed-laser deposition
Spray-pyrolysis
Grain size
Issue Date: 2010
Publisher: Elsevier
Citation: Physica B-Condensed Matter 405(7):1782-1786;01 Apr 2010
Abstract: ZnO thin films were deposited on coming glass substrates by RF magnetron sputtering at room temperature. The dependence of crystal structure, morphology and optical properties on post-deposition annealing was investigated using XRD, AFM and UV-vis Spectrophotometer. The as-deposited films were amorphous in nature. Post-deposition annealing for 1 h in air caused an improvement in crystallinity with preferential orientation along (002) direction. Better crystallinity was observed at 673 K. Crystallite size increased from 16 to 27 nm as annealing temperature was increased from 473 to 873 K. It is evident from AFM analysis that rms roughness of the film annealed at 673 K is minimum indicating better optical quality. Optical measurements show a decrease in direct band gap from 3.289 (as deposited) to 3.25 eV when the annealing temperature was increased to 673 K. With further increase in temperature, band gap increases.
URI: http://ir.niist.res.in:8080/jspui/handle/123456789/1580
ISSN: 0921-4526
Appears in Collections:2010

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