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dc.contributor.authorDaniel, G P-
dc.contributor.authorJustinvictor, V B-
dc.contributor.authorPrabitha, B N-
dc.contributor.authorJoy, K-
dc.contributor.authorPeter Koshy-
dc.contributor.authorThomas, P V-
dc.date.accessioned2014-08-01T05:54:30Z-
dc.date.available2014-08-01T05:54:30Z-
dc.date.issued2010-
dc.identifier.citationPhysica B-Condensed Matter 405(7):1782-1786;01 Apr 2010en_US
dc.identifier.issn0921-4526-
dc.identifier.urihttp://ir.niist.res.in:8080/jspui/handle/123456789/1580-
dc.description.abstractZnO thin films were deposited on coming glass substrates by RF magnetron sputtering at room temperature. The dependence of crystal structure, morphology and optical properties on post-deposition annealing was investigated using XRD, AFM and UV-vis Spectrophotometer. The as-deposited films were amorphous in nature. Post-deposition annealing for 1 h in air caused an improvement in crystallinity with preferential orientation along (002) direction. Better crystallinity was observed at 673 K. Crystallite size increased from 16 to 27 nm as annealing temperature was increased from 473 to 873 K. It is evident from AFM analysis that rms roughness of the film annealed at 673 K is minimum indicating better optical quality. Optical measurements show a decrease in direct band gap from 3.289 (as deposited) to 3.25 eV when the annealing temperature was increased to 673 K. With further increase in temperature, band gap increases.en_US
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.subjectRF sputteringen_US
dc.subjectZnO thin filmsen_US
dc.subjectAFMen_US
dc.subjectSkewnessen_US
dc.subjectKurtosisen_US
dc.subjectOptical constantsen_US
dc.subjectPulsed-laser depositionen_US
dc.subjectSpray-pyrolysisen_US
dc.subjectGrain sizeen_US
dc.titleEffect of annealing temperature on the structural and optical properties of ZnO thin films prepared by RF magnetron sputteringen_US
dc.typeArticleen_US
Appears in Collections:2010

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