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dc.contributor.authorReshmi, R-
dc.contributor.authorJayaraj, M K-
dc.contributor.authorSebastian, M T-
dc.date.accessioned2013-11-21T08:21:51Z-
dc.date.available2013-11-21T08:21:51Z-
dc.date.issued2011-
dc.identifier.citationJournal of the Electrochemical Society 158(5):G124-G127;2011en_US
dc.identifier.issn0013-4651-
dc.identifier.urihttp://ir.niist.res.in:8080/jspui/handle/123456789/791-
dc.description.abstractThe optical properties of thin films of barium strontium titanate (BST) are important due to its wide band gap, high refractive index and low absorption coefficient and hence find application in electro-optic and non-linear optical devices. Ba0.7Sr0.3TiO3 (BST) thin films were deposited by RF magnetron sputtering on fused silica and Pt/TiO2/SiO2/Si (PtSi) wafers at relatively low substrate temperature. The crystallisation of thin films strongly depends on O-2/Ar ratio in the sputtering gas. The optical parameters like band gap (E-g), refractive index (n) were studied as a function of oxygen to argon ratio in the sputtering gas. The electrical properties of BST thin films deposited on PtSi substrates as a function of O-2 to Ar ratio has also been studied. The films show 50% tunability with a minimum loss of 0.018 at 1 MHz when grown at the optimized O-2 to Ar ratio.en_US
dc.language.isoenen_US
dc.publisherThe Electrochemical Societyen_US
dc.subjectMGOen_US
dc.subjectTemperatureen_US
dc.subjectMicrostructureen_US
dc.subjectDepositionen_US
dc.subjectOptical-propertiesen_US
dc.subjectBarium strontium-titanateen_US
dc.titleInfluence of oxygen to argon ratio on the properties of RF magnetron sputtered Ba0.7Sr0.3TiO3 thin filmsen_US
dc.typeArticleen_US
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